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首页 > 商务会议 > 加工制造会议 > 2017中国国际半导体技术大会（CSTIC）更新时间：2017-01-20T09:58:03

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2017中国国际半导体技术大会（CSTIC）已截止报名

会议时间： 2017-03-12 08:00至 2017-03-13 18:00结束

会议地点：上海上海国际会议中心上海市浦东新区滨江大道2727号周边酒店预订

主办单位： SEMICON China

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会议通知
会议内容主办方介绍

2017中国国际半导体技术大会（CSTIC）宣传图

中国国际半导体技术大会(CSTIC) 2017

China Semiconductor Technology International Conference (CSTIC) 2017

Plan now to participate at CSTIC 2017, one of the largest and the most comprehensive annual semiconductor technology conferences in China and Asia since 2000. Organized by SEMI and IEEE-EDS , co-organized by IMEC and ICMTIA(The Integrated circuit Materials Industry Technology Innovation Alliance), and co-sponsored by ECS, MRS and CEMIA(the China Electronics Materials Industry Association), CSTIC 2017 will be held March 12-13, 2017 in Shanghai, China, in conjunction with SEMICON China 2017. The conference will have ten symposia cover all aspects of semiconductor technology with focus on manufacturing and advanced technology, including detail manufacturing processes, devices design, integration, materials, and equipment, as well as emerging semiconductor technologies, circuit design, and silicon material applications. Hot topics, such as memory technology, 3D integration, MEMS and Photovoltaic Technology will also be addressed in the conference.

Date and Venue

March 12-13, 2017

Shanghai International Convention Center

上海国际会议中心中国上海浦东滨江大道2727号

No.2727 Riverside Avenue Pudong, Shanghai 200120, China

SEMICON China

SEMICON China举办了2017中国国际半导体技术大会（CSTIC）和2017功率及化合物半导体论坛

会议日程（最终日程以会议现场为准）

08:45–09:30	Opening Ceremony
	Opening Remarks by Conference Chair
	Opening Remarks by SEMI
	Opening Remarks by IMEC
	Opening Remarks by Chinese Government Representatives
	Presentation of SEMI Best Student Paper Awards and SEMI Best Young Engineer
	Paper Awards

Meeting Room	3rd Floor Auditorium

09:30 –10:10	Prof.Hiroshi Amano
	Nobel Laureate in Physics, 2014
	Director, Center for Integrated Research of Future Electronics, Institute of Materials and Systems for Sustainability, Nagoya University

10:10–10:25	Coffee Break

10:25–11:05	Dr.Tzu-Yin Chiu
	CEO and Executive Director,Semiconductor Manufacturing International Corp.(SMIC)

11:05–11:35	Dr.Jong Shik Yoon
	Executive Vice President Foundry Business System-LSI,Samsung Electronics Co,LTD,Korea.

11:35–12:05	Prof.Rao Tummala
	Joseph.M Pettit Chair Professor in ECE and MSE Director, 3D Microsystems Packaging Research Center Georgia Research Alliance Eminent Scholar Georgia Institute of Technology, Atlanta, Ga, USA

12:05–13:30	7th Floor Grand Ballroom 1

Panel Discussion

Sunday, March 12, 2017

Meeting Room: 3B

17:00-18:00

Moderator:

Panel Members:

Parallel Symposium Oral Sessions

Sunday, March 12, 2017
13:30 – 18:00	Parallel Symposium Oral Sessions

Coffee Break	Conference Poster Session

Monday,March 13,2017
8:00-18:00	Parallel Symposium Oral Sessions

Joint Sessions

Symposium II and Symposium III-Lithograpy/Etch joint session
Sunday, March 12, 2017

Shanghai International Convention Cente

Meeting Room: 3rd Floor Yellow River Hall黄河厅
Session Chairs: Kafai Lai (IBM) and Ying Zhang (Applied Material)

13:30-13:35	Opening Remarks
	Kafai Lai / Ying Zhang
**13:35-14:05	TBD
	Donis Flagello, Nikon Research America
**14:05-14:35	Patterning Technology Inflections for the 10n and Beyond Logic Nodes
	Rich Wise, Lam Research
*14:35-14:55	Development of 250W EUV light source for HConsiderations for pattern fidelity control towards 5nm nodeVM lithography
	Hidetami Yaegashi, TEL
*14:55-15:15	The Insertion of extreme ultraviolet lithography (EUVL) from patterning perspective
	Weimin Gao, Synopsys
15:15-15:30	Coffee Break

Symposium II and Symposium IX-DTCO Joint session
Monday, March 13, 2017

Shanghai International Convention Center

Meeting Room: 3rd Floor Yellow River Hall黄河厅
Session chairs: Leo Pang / Yiyu Shi

*8:30-8:35	Opening Remarks
	Leo Pang / Yiyu Shi
**8:35-9:05	Design Technology Co-optimization for Disruptive Patterning Schemes
	Puneet Gupta, UCLA
**9:05-9:35	TBD
	Shaojun Wei, Tsinghua University
*9:35-9:55	TBD
	Luigi Capodieci, Motovi.ai
9:55-10:10	Coffee Break

会议嘉宾（最终出席嘉宾以会议现场为准）

朱志敏

布鲁尔科技有限公司

博士

王欣然

南京大学

教授

SangBum Kim

IBM

researcher

Dr. Qingtai Zhao

Forschungszentrum Julich

researcher

Min-hwa Chi

中芯国际

副总裁

参会指南
会议门票场馆介绍

	提前注册并付费（2017年2月20日前）	注册费（2017年2月20日后）
听众	人民币 3,700	人民币 4,200
学生（持有效证件）	人民币 2,100	人民币 2,600
晚宴（3月12日18:00-20:00）	人民币 600	人民币 800

上海国际会议中心

交通指南：

地铁二号线陆家嘴站、外滩观光隧道、583、621、623、776、778、870、872路、申高线、旅游江园线(滨江大道终点站)、82、85、581B、795路、陆家嘴环线（陆家嘴地铁站终点站）、81、797、983、旅游3号线、锦江观光巴士到东方明珠后步行5分钟即到。

上海国际会议中心地处陆家嘴金融贸易中心，毗邻东方明珠电视塔，与外滩万国建筑群隔江相望，交通设施方便快捷，地理位置得天独厚，于1999年8月落成并正式对外营业。总建筑面积11万平方米，作为上海标志性新景观，被评为建国五十年十大经典建筑之一。上海国际会议中心素以举办大型国际会议、商务论坛而蜚声海内外。位于酒店7楼的上海厅可同时容纳3000人会议，是目前国内最大的无柱型多功能厅，28个大小不等、风格迥异的多功能会议厅，均备有最先进的高科技影音系统及同声传译设备。内设五星级的，拥有273间景观豪华客房、风格迥异的餐厅设施以及丰富多样的娱乐与健身设施。

温馨提示
酒店与住宿: 为防止极端情况下活动延期或取消，建议“异地客户”与活动家客服确认参会信息后，再安排出行与住宿。
退款规则: 活动各项资源需提前采购，购票后不支持退款，可以换人参加。